Effects of substrate temperatures on the structure and properties of hafnium dioxide films.

作者: Hongfei Jiao , Xinbin Cheng , Jiangtao Lu , Ganghua Bao , Yongli Liu

DOI: 10.1364/AO.50.00C309

关键词:

摘要: … hafnium using the reactive electron beam evaporation method. X-ray diffraction was applied to determine the crystalline phase of these films, the surface morphology of the samples …

参考文章(16)
M. Alvisi, F. De Tomasi, M.R. Perrone, M.L. Protopapa, A. Rizzo, F. Sarto, S. Scaglione, Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films Thin Solid Films. ,vol. 396, pp. 44- 52 ,(2001) , 10.1016/S0040-6090(01)01184-1
J. P. Borgogno, B. Lazarides, E. Pelletier, Automatic determination of the optical constants of inhomogeneous thin films Applied Optics. ,vol. 21, pp. 4020- 4029 ,(1982) , 10.1364/AO.21.004020
Christopher J. Stolz, Francois Y. Genin, Mark R. Kozlowski, Dale Long, Ramin Lalazari, Zhouling Wu, Pao-Kuang Kuo, Influence of microstructure on laser damage threshold of IBS coatings Symposium on optical materials for high power lasers, Orlando, FL (United States), 30 Oct - 1 Nov 1995. ,vol. 2714, pp. 351- 359 ,(1996) , 10.1117/12.240403
M. Alvisi, S. Scaglione, S. Martelli, A. Rizzo, L. Vasanelli, Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance Thin Solid Films. ,vol. 354, pp. 19- 23 ,(1999) , 10.1016/S0040-6090(99)00534-9
J. B. Oliver, S. Papernov, A. W. Schmid, J. C. Lambropoulos, Optimization of laser-damage resistance of evaporated hafnia films at 351nm Laser-Induced Damage in Optical Materials: 2008. ,vol. 7132, ,(2008) , 10.1117/12.805383
Erich J. Hacker, Hans Lauth, Peter Weisbrodt, Reinhard Wolf, Structural influences on the laser damage thresholds of oxide coatings Thin Films for Optical Systems. ,vol. 1782, pp. 447- 458 ,(1993) , 10.1117/12.141022
S. Kremmer, H. Wurmbauer, C. Teichert, G. Tallarida, S. Spiga, C. Wiemer, M. Fanciulli, Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films studied by conducting atomic-force microscopy Journal of Applied Physics. ,vol. 97, pp. 074315- ,(2005) , 10.1063/1.1885166
John A. Thornton, Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings Journal of Vacuum Science and Technology. ,vol. 11, pp. 666- 670 ,(1974) , 10.1116/1.1312732
Salvatore Scaglione, Francesca Sarto, Marco Alvisi, Antonella Rizzo, Maria R. Perrone, Maria L. Protopapa, Correlation between the structural and optical properties of ion-assisted hafnia thin films Laser-Induced Damage in Optical Materials: 1999. ,vol. 3902, pp. 194- 203 ,(2000) , 10.1117/12.379297
A. V. Tikhonravov, M. K. Trubetskov, Brian T. Sullivan, J. A. Dobrowolski, Influence of small inhomogeneities on the spectral characteristics of single thin films Applied Optics. ,vol. 36, pp. 7188- 7198 ,(1997) , 10.1364/AO.36.007188