Apparatus for in-situ chamber cleaning

摘要: An apparatus for the in-situ cleaning of interior surfaces a processing chamber (14) and/or tooling or substrates disposed within said where is composed substantially dielectric material having at least one powered and grounded electrode (30) formed from thin film conductive deposited directly on exterior surface chamber, means introducing gas (26) into establishing maintaining reduced pressure environment (22) supply radio frequency power (32). A plasma created in by interaction RF field established upon application to electrodes with creates gaseous species that etch unwanted deposits contaminates chamber. Several different configurations structures are shown as well applications chambers several types equipment.