Design of electron blocking layers for improving internal quantum efficiency of InGaN/AlGaN-based ultraviolet light-emitting diodes

作者: Tae Hoon Park , Tae Geun Kim

DOI: 10.1007/S00339-015-9345-3

关键词:

摘要: In this paper, we designed and simulated InGaN/AlGaN-based near-ultraviolet light-emitting diode (NUV LED) epi-structures to obtain high internal quantum efficiency low droop. When the conventional epi-structure of an $$\hbox {Al}_{0.1}\hbox {Gal}_{0.9}\hbox {N}$$ last barrier {Al}_{0.21}\hbox {Gal}_{0.79}\hbox electron blocking layer (EBL) was replaced with a graded multi-step EBLs, NUV LED showed 35 % higher 25 % more suppression droop than LED. Furthermore, detailed study grading effect EBL revealed that 10-step EBLs increase performance when compared other structures. These results are attributed polarization-induced effect, which reduces leakage increases hole injection efficiency.

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