Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties

作者: David Mordo , Easwar Srinivasan , Seon-Mee Cho , Brian G. Lu

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摘要: Methods and apparatus for preparing a porous low-k dielectric material on substrate are provided. The methods optionally involve the use of ultraviolet radiation to react with remove porogen from containing precursor film leaving matrix further exposing increase mechanical strength matrix. Some activating gas create reactive species that can clean reaction chamber. One disclosed includes an array multiple sources be controlled such different wavelengths light used irradiate sample at time.

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