Photo acid generator compounds, photo resists, and method for improving bias

作者: Gregory Breyta , Kathleen H. Martinek , Wayne M. Moreau , Hiroshi Ito , Premlatha Jagannathan

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摘要: Several mid UV photo acid generators (PAGs), a chemically amplified resist (CAMP), and method for improving nested to isolated line bias are provided. Similarly, speed may also be improved. Unlike conventional PAGs, the present invention's PAG compounds, composition, do not require sensitizer. Specifically, PAGs provided that bear chromophore capable of receiving radiation, particularly I-line, suitable use in having 500 mJ/cm 2 or less, but preferrably 200 less. For example, can sulfonium iodonium salt, such as anthryl, butyl, methyl triflate bis(4-t-butylphenyl)iodonium 9,10-dimethoxyanthracene sulfonate. The forming part selected from polyaromatic hydrocarbons, chrysenes, pyrenes, fluoranthenes, anthrones, benzophenones, thioxanthones, anthracenes, phenanthrenes, preferably anthracenes.

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