Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique
作者： Neha Sharma , N. Kumar , B. Sundaravel , Kalpataru Panda , Wang David
DOI: 10.1016/J.TRIBOINT.2011.03.028
关键词:
摘要: Abstract Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments performed by varying H 2 content in CH 4 /H plasma during synthesis. Raman spectral analysis revealed that with decrease hydrogen plasma, I D / G ratio decreases formation of smaller crystallites. Such a film possesses large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount present passivates dangling σ-bond causing ultra-low friction and extremely low wear evident improvement microstructure.
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