Influence of Ti doping on the microstructural and electrochromic properties of dip-coated nanocrystalline V 2 O 5 thin films
作者： Anil Kumar , P. P. Sahay
DOI: 10.1007/S10971-020-05298-9
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摘要: The nanocrystalline V2O5 thin films were prepared via a dip-coating method by controlled hydrolytic polycondensation of the vanadium (V) oxytriisopropoxide (VO(OC3H7)3) in isopropanol. For Ti doping, titanium (IV) isopropoxide (Ti(OC3H7)4) was used. as-deposited after thermal treatment at 500 °C under ambient air for 30 min subjected to characterizations their structural, morphological, and electrochromic properties. X-ray diffraction (XRD) analyses confirm an orthorhombic phase pentaoxide (PDF # 41-1426), which is also supported Fourier transform infrared (FTIR) analyses. properties divulge that 5 at% Ti-doped film has fast switching time (coloration time: 0.59 s bleaching 0.42 s), high net charge density good reversibility. Nyquist impedance plots have been evaluated fit simulation analysis using Nova software, taking into account equivalent electrical circuit model.
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