Highly Sensitive, Fast-Responding, and Stable Photodetector Based on ALD-Developed Monolayer TiO 2
作者： Mohammad Karbalaei Akbari , Zhenyin Hai , Stephen Depuydt , Eugene Kats , Jie Hu
DOI: 10.1109/TNANO.2017.2720199
关键词:
摘要: In this paper, high-quality wafer-scale monolayer TiO2 films were synthesized via atomic layer deposition and their main characteristics investigated. The deposited subsequently utilized in photodetectors (PDs), which demonstrated considerable optoelectronic performance with ultrafast response (30 μ s) recovery (63 time, high on/off ratio (220), good reversibility, great long-term stability (less than 2% variation after 1000 cycles). photoresponsivity ( Rλ ) external quantum efficiency of 0.352 A/W 109.12% were, respectively, attained at the incident laser power density 118 mW/cm2 $\lambda = \text{400}\; \text{nm}$ $V_{{\rm{DS}}} \text{1}\; \text{V}$ . These photoelectrical TiO2-based PDs confirmed that nanostructure could be an excellent candidate for various smart portable applications such as UV-detection devices, photoswitches, high-speed optical communications, image sensors.
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