Method for the production of a microstructured SiO2/TiO2 layer system

摘要: Process involves coating substrate with silica/titania sol, drying, optionally applying coat, embossing and heating at 250-550 degrees C. Sol is prepared by dissolving silicon tetraalk(en)oxide (I) in 1-5 carbon (C) aliphatic alcohol (II), prehydrolysis, or reacting a titanium (III) beta -keto-esters and/or -diketone, adding this solution to the first dilution. Production of microstructurized laminate (SiO2/TiO2) layer(s) comprises: (i) preparing SiO2/TiO2 sol; (ii) (iii) drying another coat sol known sol-gel coat; (iv) producing microstructures dwell 80-110 C; (v) heat treatment The by: (a) formula (II); (b) prehydrolysis water aqueous acid alkaline solution; (c) -diketone diluting resultant (II) if necessary; (d) from (a); (e) mixed 2-8 C diol. Si(OR)4 Ti(OR)4 R = 1-10 linear, branched cyclic alkyl alkenyl, carbonyl, ester carboxyl function(s)