Microelectronics Processing: Inorganic Materials Characterization

摘要: Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices Electrical Semiconductor Materials Dopant Profiles by Spreading Resistance Technique SEM Techniques for Defect Diagnostics Submicron VLSI Technology Applications Secondary Ion Mass Spectroscopy to Auger Electron Microelectronics X-Ray Photoelectron Applied Application Neutron Depth Profiling Processing Thermal-Wave Measurement Thin Film Thickness Materials, Films, Interfaces Optical Reflectance Ellipsometric Oxygen Carbon Content Silicon Wafers Fourier Transform Spectrophotometry Raman Microprobe Problems GaAs Magneto-Optical Photoluminescent Imaging a Scanning Microscope Spectrometry Service Laboratory Using Elemental Isotope Analysis Inductively Coupled Plasma (ICP-MS) Activation Electronics Trace Element Survey Analyses Spark Source Spectrography (SSMS) Components Phosphorus Doped Oxides Process Control Vacuum-Deposited Nickel-Chromium Fabrication Reproducible Resistors Spin-On Glass Films as Planarizing Dielectric Effects Various Chemistries on Wafer Cleaning Monitoring Particles Gases Laser Counter Problem Solving: The Synergism Complementary