Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation
作者： S. Gevers , J. I. Flege , B. Kaemena , D. Bruns , T. Weisemoeller
DOI: 10.1063/1.3525175
关键词:
摘要: Ultrathin praseodymia films have been deposited on both Cl-passivated and nonpassivated Si(111) substrates by molecular beam epitaxy. Comparative studies the crystallinity stoichiometry are performed x-ray photoelectron spectroscopy, standing waves, reflectometry. On an amorphous silicate film is formed. In contrast, form a well-ordered crystalline with cubic-Pr2O3 (bixbyite) structure. The vertical lattice constant of increased 1.4% compared to bulk value. Furthermore, formation extended interface layers suppressed confined only one monolayer.
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