Vertical heat-treating apparatus

作者: Hironobu Nishi

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摘要: A vertical heat-treating apparatus which is effective for preventing dust or fine particles from being attached to a wafer during the loading/unloading transport of thereby manufacture high-quality wafers. This comprises carrier stocker storing plurality carriers, mechanism transferring wafers between carriers and vessel, furnaces wafers, transporting vessel furnace, gas supply means forming clear stream passing exclusively through and/or mechanism.

参考文章(11)
Seishiro Sato, Wataru Ohkase, Hiroyuki Mitsuhashi, Heat-treating apparatus ,(1988)
James E Herlinger, Gary W Yee, Katsuhito Nishikawa, Donald L Schuman, Lynn Weber, Jean Benoit Hugues, Method and apparatus for transferring wafers between cassettes and a boat ,(1986)
Seishiro Sato, Wataru Ohkase, Semiconductor wafer treating apparatus ,(1988)
Masaya Seki, Kenya Ito, Kazuyuki Inoue, Mitsuhiko Shirakashi, Kenji Yamaguchi, Tamami Takahashi, Substrate Processing Apparatus ,(2005)
Hans Willem Piekaar, Boudewijn Gijsbert Sluijk, Hubertus Arnoldus Corsius, Ernst Hendrik August Granneman, Method for depositing a layer on a substrate and also a processing system for that purpose ,(1990)
Katsumi Ishii, Atsushi Wada, Horizontal/vertical conversion transporting apparatus ,(1990)
Hironobu Nishi, Kenichi Yamaga, Masashi Fumoto, Kazutoshi Sawado, Yoshinori Mochizuki, Takanobu Asano, Shozo Ito, Semiconductor wafer transferring method and apparatus and boat for thermal treatment of a semiconductor wafer ,(1988)
Shigematsu Tatsuhiko, Murakawa Kensaku, Sakamoto Junichi, Sugawara Shigeo, Mori Mikio, VAPOR GROWTH APPARATUS ,(1988)