作者: A.D Müller , F Müller , M Hietschold
DOI: 10.1016/S0040-6090(99)01117-7
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摘要: Abstract The localized electrochemical deposition of metals using a pulled micropipette as tip (similar in scanning ion-conductance microscopy) is new probe lithography method, which still under development. This paper investigates the dependence deposited structures on parameters (electrode potentials, tipsample distance). A 2D numerical simulation used to visualize potential distribution present geometry. linear copper structure (300 μm long and 100 broad) has been produced first experiment.