Photoelectric Cooperative Induced Wetting on Aligned‐Nanopore Arrays for Liquid Reprography

摘要: Surface wettability as a response to the cooperation of different stimuli has been intensively studied and provides more advantages than single stimulus. Recently, we demonstrated patterned transition from Cassie Wenzel state on superhydrophobic aligned-ZnO-nanorod array surface via photoelectric cooperative wetting process. However, specific aligned-nanorod structure such devices is easily damaged due their low mechanical strength cannot sustain multiple transfer printing. Meanwhile, process not controlled air-permeable adjacent nanorods. As result, in practice, it difficult apply liquid reprography nanostructure. Here, demonstrate induced aligned-nanopore TiO2-coated nanoporous AAO film, which high excellent controllability. Liquid achieved through surface, new progression reprography, promising for gearing up application reprography.