Cobalt electroless plating in microelectronic devices
作者： Vincent Paneccasio , Richard Hurtubise , Charles Valverde , Nicolai Petrov , Christian Witt
DOI:
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摘要: An electroless plating method and composition for depositing Co or alloys onto a metal-based substrate in manufacture of microelectronic devices, involving source ions, reducing agent the depositions ions to metal substrate, an oxime-based compound stabilizer.
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