Effect of electron energy distribution functions on plasma generated vacuum ultraviolet in a diffusion plasma excited by a microwave surface wave
作者： J. P. Zhao , L. Chen , M. Funk , R. Sundararajan , T. Nozawa
DOI: 10.1063/1.4813818
关键词:
摘要: Plasma generated vacuum ultraviolet (VUV) in diffusion plasma excited by a microwave surface wave has been studied using dielectric-based VUV sensors. Evolution of the as function distance from power coupling is investigated. Experimental results have indicated that energy and spatial distributions are mainly controlled distribution functions electrons, i.e., electron (EEDFs). The study implies designing EEDF plasma, one could be able to tailor different applications such dielectric etching or photo resist smoothing.
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