Ophthalmic wavefront measuring devices

作者: Michael Schottner , Frank Mueller , Josef Bille , Denwood F. Ross

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摘要: Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved capabilities are achieved through input beam modification which includes sensing an image a emanating from eye response to with sensor then modifying the adaptive optical device based on sensed information. (2) Corrective verification adpative element produce corrected at patients eye. (3) Binocular pair of eyes aberrations one first opthalmic produced by other second substantially simultaneously.

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