Covalent bonding of thiophenes to Si(111) by a halogenation/thienylation route

作者: J. He , S.N. Patitsas , K.F. Preston , R.A. Wolkow , D.D.M. Wayner

DOI: 10.1016/S0009-2614(98)00128-6

关键词:

摘要: Abstract Thienyl monolayers covalently bonded to a Si(111) surface were prepared by wet chemical process in which Si(111)–H was brominated form Si(111)–Br and further reacted with lithiated thiophenes. Both N -bromosuccinimide bromochloroform found be effective brominating reagents. The derivatized surfaces characterized XPS, AES, ATR–FTIR NEXAFS.

参考文章(27)
B. Liedberg, Z. Yang, I. Engquist, M. Wirde, U. Gelius, G. Götz, P. Bäuerle, R.-M. Rummel, Ch. Ziegler, W. Göpel, Self-assembly of alpha-functionalized terthiophenes on gold Journal of Physical Chemistry B. ,vol. 101, pp. 5951- 5962 ,(1997) , 10.1021/JP970229+
Ashish Bansal, Xiuling Li, Iver Lauermann, Nathan S. Lewis, Sang I. Yi, W. H. Weinberg, Alkylation of Si Surfaces Using a Two-Step Halogenation/Grignard Route Journal of the American Chemical Society. ,vol. 118, pp. 7225- 7226 ,(1996) , 10.1021/JA960348N
M. J. Lercel, G. F. Redinbo, H. G. Craighead, C. W. Sheen, D. L. Allara, Scanning tunneling microscopy based lithography of octadecanethiol on Au and GaAs Applied Physics Letters. ,vol. 65, pp. 974- 976 ,(1994) , 10.1063/1.113012
Namyong Y. Kim, Paul E. Laibinis, THERMAL DERIVATIZATION OF POROUS SILICON WITH ALCOHOLS Journal of the American Chemical Society. ,vol. 119, pp. 2297- 2298 ,(1997) , 10.1021/JA963540Y
AP Hitchcock, JA Horsley, J.+ Stöhr, None, Inner shell excitation of thiophene and thiolane: Gas, solid, and monolayer states Journal of Chemical Physics. ,vol. 85, pp. 4835- 4848 ,(1986) , 10.1063/1.451718
Matthew R. Linford, Christopher E. D. Chidsey, Alkyl monolayers covalently bonded to silicon surfaces Journal of the American Chemical Society. ,vol. 115, pp. 12631- 12632 ,(1993) , 10.1021/JA00079A071
John A. Glass, Edward A. Wovchko, John T. Yates, Reaction of Methanol with Porous Silicon Surface Science. ,vol. 338, pp. 125- 137 ,(1995) , 10.1016/0039-6028(95)00599-4
M. Warntjes, C. Vieillard, F. Ozanam, J. ‐N. Chazalviel, Electrochemical Methoxylation of Porous Silicon Surface Journal of The Electrochemical Society. ,vol. 142, pp. 4138- 4142 ,(1995) , 10.1149/1.2048476
R. C. Tiberio, H. G. Craighead, M. Lercel, T. Lau, C. W. Sheen, D. L. Allara, Self‐assembled monolayer electron beam resist on GaAs Applied Physics Letters. ,vol. 62, pp. 476- 478 ,(1993) , 10.1063/1.108938
Matthew R. Linford, Paul Fenter, Peter M. Eisenberger, Christopher E. D. Chidsey, Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated Silicon Journal of the American Chemical Society. ,vol. 117, pp. 3145- 3155 ,(1995) , 10.1021/JA00116A019