Apparatus for electrostatically depositing and retaining materials upon a substrate
作者： Timothy Allen Pletcher
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摘要: A substrate (104) having a planar conductive plating (106) located on first surface of dielectric layer (108) and collection trace (110) second the such that have parallel, spaced apart relation. The is charged by supplying voltage to establish differential across (108). material be deposited (116) polarity opposite so (102) electrostatically retained.
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