Effects of oxygen/argon pressure ratio on the structural and optical properties of Mn-doped ZnO thin films prepared by magnetron pulsed co-sputtering
作者： Xiaoxia Suo , Shujun Zhao , Yujing Ran , Haonan Liu , Zhaotan Jiang
DOI: 10.1016/J.SURFCOAT.2018.10.084
关键词:
摘要: Abstract Manganese doped ZnO (Zn0.97Mn0.3Oy) thin films were deposited by magnetron pulsed co-sputtering. The oxygen content of the was controlled gas flow ratio to argon r. influence r on structure, surface morphology, optical properties and resistivity studied. A preferential growth along c axis found in all films. As increases, grain size decreases, but lattice constant c, compressive stress σ, dislocation δ density increase. absorption edge shifts toward shorter wavelength with increasing, band gap is narrowed lower values. also reduced partial pressure. results indicate a possibility fabricate multifunctional devices using manganese
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