Chemically vapor deposited silicon carbide (SiC) for optical applications

作者: Michael A. Pickering , Raymond L. Taylor , Joseph T. Keeley , George A. Graves

DOI: 10.1016/0168-9002(90)90040-D

关键词:

摘要: Abstract In this paper we present important physical, thermal, mechanical, and optical properties of cubic (β) silicon carbide produced via a bulk chemical vapor deposition (CVD) process developed at CVD Incorporated. This SiC has been identified as the leading mirror material for high energy synchrotron radiation because its thermal conductivity, low expansion, polishability, reflectance in vacuum UV. However, it difficult to obtain quality, monolithic, mirrors large sizes, i.e., greater than 10–20 cm. Recently, Incorporated successful scaling an produce monolithic pieces up 60 cm (24 in.) diameter plates 76 (30 long by 46 (18 wide with thicknesses 13 mm (0.5 in.). The that make attractive applications, such optics, will be discussed.

参考文章(7)
W.J. Choyke, Edward. D. Palik, Silicon Carbide (SiC) Handbook of Optical Constants of Solids. pp. 587- 595 ,(1997) , 10.1016/B978-012544415-6.50029-7
W. A. Bryant, The fundamentals of chemical vapour deposition Journal of Materials Science. ,vol. 12, pp. 1285- 1306 ,(1977) , 10.1007/BF00540843
Ritva A. M. Keski-Kuha, John F. Osantowski, Howard Herzig, Jeffrey S. Gum, Albert R. Toft, Normal incidence reflectance of ion beam deposited SiC films in the EUV Applied Optics. ,vol. 27, pp. 2815- 2816 ,(1988) , 10.1364/AO.27.002815
Victor Rehn, W.J. Choyke, Sic mirrors for synchrotron radiation Nuclear Instruments and Methods. ,vol. 177, pp. 173- 178 ,(1980) , 10.1016/0029-554X(80)90547-9
Margaret M. Kelly, J. B. West, Fabrication And Use Of Silicon Carbide Mirrors For Synchrotron Radiation Reflecting Optics for Synchrotron Radiation. ,vol. 0315, pp. 135- 139 ,(1982) , 10.1117/12.933000
Victor Rehn, J. L. Stanford, A. D. Baer, V. O. Jones, W. J. Choyke, Total integrated optical scattering in the vacuum ultraviolet: polished CVD SiC Applied Optics. ,vol. 16, pp. 1111- 1112 ,(1977) , 10.1364/AO.16.001111