作者: F. Marinello , S. Carmignato , A. Voltan , E. Savio , L. De Chiffre
DOI: 10.1115/1.4001242
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摘要: This paper aimed at identifying the error sources that occur in dimensional measurements performed using atomic force microscopy. In particular, a set of characterization techniques for errors quantification is presented. The discussion on organized four main categories: scanning system, tip-surface interaction, environment, and data processing. discussed include scaling effects, squareness errors, hysteresis, creep, tip convolution, thermal drift. A mathematical model measurement system eventually described, as reference basis characterization, with an applicative example silicon grating.