Effects of different plasma species (atomic N, metastable N*2, and ions) on the optical properties of dilute nitride materials grown by plasma-assisted molecular-beam epitaxy

摘要: This letter studies the effects of atomic N, metastable N2*, and ionic species on optical properties dilute nitride materials. Ga0.8In0.2N0.01As0.99 was grown using a 1% N2 in Ar gas mix from an Applied-Epi Unibulb™ rf plasma source. Isonitrogen samples with without ions were studied various operating conditions. Optical emission spectrometry used to characterize relative proportions different active nitrogen (atomic N N2*). Samples higher proportion resulted best overall material quality, although this improvement observed at high annealing temperatures. At lower temperatures, increased blueshifts for N; however, there no noticeable influence blueshift regardless whether or N2* dominant present plasma. The key implication work is that it helps elucid...