Analysis of Plasma Reaction for Decomposition of CHF3 in a Dielectric Barrier Discharge
作者： Duc Ba Nguyen , Seong Eun Hong , Hyun Su Koo , Won Gyu Lee
DOI: 10.1080/00986445.2016.1245188
关键词:
摘要: The decomposition of CHF3 in a mixture with O2 and Ar was investigated coaxial dielectric barrier discharge at atmospheric pressure. increased linearly regard to specific energy input (SEI), whereas efficiency decreased. main product CO2, its selectivity high SEI the presence feed, but an increase feed led decrease rate. An total flow rate absolute amount efficiency; however, A complete occurred under 1.54 kJ/L CO2 CO as 89.87% 7.00%, respectively. Optical emission spectroscopic analysis could explain available reaction pathways for CHF3/O2/Ar plasma show possibility F2 HF formation.
sci-hub.se 参考文章(38)
Ya-Fen Wang, Wen-Jhy Lee, Chuh-Yung Chen, Lien-Te Hsieh, Reaction Mechanisms in Both a CHF3/O2/Ar and CHF3/H2/Ar Radio Frequency Plasma Environment Industrial & Engineering Chemistry Research. ,vol. 38, pp. 3199- 3210 ,(1999) , 10.1021/IE9900519
Nonthermal Plasma Chemistry and Physics CRC Press. ,(2012) , 10.1201/B12956
Duc Ba Nguyen, Won Gyu Lee, Analysis of helium addition for enhancement of reactivity between CH4 and CO2 in atmospheric pressure plasma Journal of Industrial and Engineering Chemistry. ,vol. 32, pp. 187- 194 ,(2015) , 10.1016/J.JIEC.2015.08.016
Wenfeng Han, Yuliang Chen, Bibo Jin, Huazhang Liu, Hai Yu, Catalytic hydrolysis of trifluoromethane over alumina Greenhouse Gases-Science and Technology. ,vol. 4, pp. 121- 130 ,(2014) , 10.1002/GHG.1376
Jong Yeol Jeon, Xiu-Feng Xu, Mi Hwa Choi, Hee Young Kim, Yong-Ki Park, Hydrolytic decomposition of PFCs over AlPO4–Al2O3 catalyst Chemical Communications. pp. 1244- 1245 ,(2003) , 10.1039/B302064A
Bill A. Wofford, Marc W. Jackson, Chris Hartz, John W. Bevan, Surface Wave Plasma Abatement of CHF3 and CF4 Containing Semiconductor Process Emissions Environmental Science & Technology. ,vol. 33, pp. 1892- 1897 ,(1999) , 10.1021/ES9805472
Andrii Vakulka, Gašper Tavčar, Tomaž Skapin, Interaction of trifluoromethane (CHF3) with alkali hydroxides and carbonates Journal of Fluorine Chemistry. ,vol. 142, pp. 52- 59 ,(2012) , 10.1016/J.JFLUCHEM.2012.06.017
O. Keller, C. Mang, M. Nikola, G. Schulz, Absolute and relative emission cross sections for electron impact on CH 3 F, CH 2 F 2 and CHF 3 European Physical Journal D. ,vol. 37, pp. 315- 322 ,(1996) , 10.1007/S004600050046
Hongxia Zhang, Ching Fai Ng, Suk Yin Lai, Catalytic decomposition of chlorodifluoromethane (HCFC-22) over platinum supported on TiO2–ZrO2 mixed oxides Applied Catalysis B-environmental. ,vol. 55, pp. 301- 307 ,(2005) , 10.1016/J.APCATB.2004.09.003
Ramses Snoeckx, Robby Aerts, Xin Tu, Annemie Bogaerts, Plasma-Based Dry Reforming: A Computational Study Ranging from the Nanoseconds to Seconds Time Scale Journal of Physical Chemistry C. ,vol. 117, pp. 4957- 4970 ,(2013) , 10.1021/JP311912B