Excimer laser ablation of polymers and glasses for grating fabrication
作者： P.E. Dyer , R.J. Farley , R. Giedl , D.M. Karnakis
DOI: 10.1016/0169-4332(95)00528-5
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摘要: In this paper we describe studies carried out related to grating formation for optoelectronics applications using 248 nm and 193 nm excimer lasers. These include basic studies of UV …
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