作者: R. M. Laine , A. Sellinger
DOI: 10.1002/9780470682531.PAT0201
关键词:
摘要: 1 Introduction 2 Criteria that Define a Useful Precursor 3 Precursors Containing Si and N 4 Precursors C 5 Precursors to SiO Materials Keywords: Si-containing compounds or polymers; chemical vapor deposition, CVD; microstructure densification control; Si-containing ceramic precursors; Tonen group - combined synthesis processing approach; precursors Si–O containing materials; group I II silicate precursors; NMR end analysis