Apparatus and Process for Depositing a Thin Layer of Resist on a Substrate

作者: Vladimir S. Tarasov , Holly G. Gates , Peter E. Kane , Emanuel M. Sachs , Guy M. Danner

DOI:

关键词:

摘要: The present inventions relate to the formation of a thin polymer film on substrate. Apparatus is described for transforming solid resist into an aerosol small particles, electrostatically charging and depositing particles onto substrate, flowing continuous layer. further by heating form low viscosity liquid such as compatible with nebulization applying techniques jet or impact particle sizing aerosol. A method using ionized gas confer charge progression devices establish electric field directing flow charged associated apparatus results in high collection efficiency particles.

参考文章(15)
Gurtej S. Sandhu, Delivery of solid chemical precursors ,(2004)
Scott L. Coguill, Lawrence C. Farrar, Stephen L. Galbraith, Darren L. Tuss, Milan Ivosevic, Thermal spray formation of polymer coatings ,(2007)
Sami Kauppinen, Markku Rajala, Apparatus and method for coating glass substrate ,(2010)
Frank Swallow, Peter Dobbyn, Plasma generating electrode assembly ,(2004)
Benjamin Y. H. Liu, Virgil A. Marple, James J. Sun, Method and apparatus for thin film deposition on large area substrates ,(1998)
Carlos A. Paz de Araujo, Larry D. McMillan, Methods and apparatus for material deposition ,(1989)
Bernd Sachweh, Michael Mertler, David Y.H. Pui, Weon Gyu Shin, Heinz Fissan, Jing Wang, Michael Schäfer, Markus Linsenbühler, Measurement system for the multidimensional aerosol characterization ,(2009)
Shouichi Terada, Tsuyoshi Mizuno, Takeshi Uehara, Method for forming thin film and film-forming device ,(2006)
Matthew Dewey Hubert, Matthew Stainer, James Daniel Tremel, Electro-form nozzle apparatus and method for solution coating ,(2009)