Structure and phase formation in Cu–Mn alloy thin films deposited at room temperature
作者： Zs. Czigány , F. Misják , O. Geszti , G. Radnóczi
DOI: 10.1016/J.ACTAMAT.2012.09.034
关键词:
摘要: Abstract Transmission electron microscopy characterization of Cu–Mn alloy thin films deposited by DC magnetron sputtering is applied to reveal the formation phases throughout composition range. Pure Cu and Mn exhibit face-centred cubic (fcc) α-Mn phases, respectively. At room temperature low content have fcc structure (γ-phase). can substitute in lattice up ∼35 at.% Mn. The parameter follows a linear relationship 0 = a + 0.322c (in A), where = 3.615 A c atomic concentration. high content, above 50 at.% Mn, homogeneous one-phase observed, possessing short-range order α-Mn. incorporation into suggests that this changes from crystalline disordered as increases. A narrow two-phase region exists between 35 45 at.% grain size minimum 2–3 nm was observed 35–65 at.% region.
harvard.edu
sci-hub.se 参考文章(19)
Si-Hyung Lee, Jeon-Kook Lee, Ki Hyun Yoon, Growth of highlyc-axis textured AlN films on Mo electrodes for film bulk acoustic wave resonators Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 21, pp. 1- 5 ,(2003) , 10.1116/1.1521961
J. A. Cahill, A. D. Kirshenbaum, THE DENSITY OF LIQUID COPPER FROM ITS MELTING POINT (1356°K.) TO 2500°K. AND AN ESTIMATE OF ITS CRITICAL CONSTANTS1,2 The Journal of Physical Chemistry. ,vol. 66, pp. 1080- 1082 ,(1962) , 10.1021/J100812A027
I. Petrov, P. B. Barna, L. Hultman, J. E. Greene, Microstructural evolution during film growth Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 21, pp. S117- S128 ,(2003) , 10.1116/1.1601610
D.B. Miracle, The efficient cluster packing model : An atomic structural model for metallic glasses Acta Materialia. ,vol. 54, pp. 4317- 4336 ,(2006) , 10.1016/J.ACTAMAT.2006.06.002
J.L. Lábár, M. Adamik, B.P. Barna, Zs. Czigány, Zs. Fogarassy, Z.E. Horváth, O. Geszti, F. Misják, J. Morgiel, G. Radnóczi, G. Sáfrán, L. Székely, T. Szüts, Electron Diffraction Based Analysis of Phase Fractions and Texture in Nanocrystalline Thin Films, Part III: Application Examples Microscopy and Microanalysis. ,vol. 18, pp. 406- 420 ,(2012) , 10.1017/S1431927611012803
JM Ablett, JC Woicik, Zs Tőkei, Scott List, Elaine Dimasi, Phase identification of self-forming Cu–Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structure Applied Physics Letters. ,vol. 94, pp. 042112- ,(2009) , 10.1063/1.3068500
M. Haneda, J. Iijima, J. Koike, Growth behavior of self-formed barrier at Cu–Mn∕SiO2 interface at 250–450°C Applied Physics Letters. ,vol. 90, pp. 252107- ,(2007) , 10.1063/1.2750402
Zs. Czigány, G. Radnóczi, Columnar growth structure and evolution of wavy interface morphology in amorphous and polycrystalline multilayered thin films Thin Solid Films. ,vol. 347, pp. 133- 145 ,(1999) , 10.1016/S0040-6090(98)01760-X
János L. Lábár, Electron Diffraction Based Analysis of Phase Fractions and Texture in Nanocrystalline Thin Films, Part I: Principles Microscopy and Microanalysis. ,vol. 14, pp. 287- 295 ,(2008) , 10.1017/S1431927608080380
Kenji Matsumoto, Koji Neishi, Hitoshi Itoh, Hiroshi Sato, Shigetoshi Hosaka, Junichi Koike, Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures Applied Physics Express. ,vol. 2, pp. 036503- ,(2009) , 10.1143/APEX.2.036503