Synthesis of Diamond Thin Films by Thermal CVD Using Organic Compounds

摘要: Diamond thin films have been formed by thermal chemical vapor deposition (thermal CVD) using the organic compounds such as CH3OH, C2H5OH, CH3COCH3 C2H5OC2H5, and (CH3)3N. The are grown on silicon substrates with high growth rate (8?10 ?m/h) under pressure ranging 1?800 Torr. This is ten or several times faster than CVD method hydrocarbons CH4 C2H2. good crystallinity quality in sense of electron diffraction Raman spectrum. Vicker's hardness film about 10000 kg/mm2 gravity that 3.52 g/cm3.