Computer Aided Patterning Design for Self-Assembled Microsphere Lithography (SA-MSL).

摘要: In this paper, we use a finite difference time domain solver to simulate the near field optical properties of self-assembled microsphere arrays when exposed an incoherent light source. Such are typically used for lithography where each sphere acts as ball lens, focusing ultraviolet into underlying photoresist layer. It is well known that circular features can be patterned using technique. However, here, our simulations show additional nanometer scale introduced pattern by optimising dimensions and exposure conditions. These shown arise from contact points between microspheres which produce paths leakage. For hexagonally close packed arrays, six lead star shapes in photoresist. have subfeature sizes comparable current achievable resolution low-cost fabrication techniques.