ZnO thin films growth by pulsed vacuum arc discharge

摘要: Abstract A study of structural and morphologic features ZnO coatings grown by pulsed vacuum arc discharge is presented in this work. The characteristics the plasma generated during production process are determined using Optical Emission Spectroscopy technique. system employed for growing films consists a chamber with two opposite electrodes (the cathode target zinc anode substrate glass). gas used filling reactor was high purity oxygen. at pressure 200 Pa voltage 200 V. Coatings were characterized X-ray diffraction scanning probe microscopy (SPM) techniques. XRD patterns showed hexagonal crystalline structure peaks produced planes (002) (103). roughness observed 98.6 nm. No great quantity nanodroppers on surface. Plasma spectroscopic studies revealed many lines belonging to different species like Zn (328.2, 330.3, 334.5 nm), + (491.3 492.5 nm), O (372 nm) (336.1, 337.25 518 nm) weak bands (526.47, 531.2, 536.94 nm). presence an important finding because, techniques, authors have reported as being exclusively surface not into plasma. electron temperature ( T e ) density n means methods such relation between same ionization state calculation Stark Broadening .