Study of Dispersion and Thermal Stability of V2O5/TiO2−SiO2 Catalysts by XPS and Other Techniques
作者： Benjaram M. Reddy , I. Ganesh , E. Padmanabha Reddy
DOI: 10.1021/JP963091O
关键词:
摘要: … subjected to thermal treatments from 773 to 1073 K. The influence of heat treatments on the dispersion … including XRD, FTIR, XPS, oxygen uptake, and BET surface area measurements. …
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sci-hub.se 参考文章(42)
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