Field-biased second harmonic generation metrology
作者： Viktor Koldiaev , Marc Kryger , John Changala
DOI:
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摘要: Various approaches can be used to interrogate a surface such as of layered semiconductor structure on wafer. Certain employ Second Harmonic Generation and in some cases may utilize pump probe radiation. Other involve determining current flow from sample illuminated with Decay constants measured provide information regarding the sample. Additionally, electric and/or magnetic field biases applied additional information.
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