Nanostructured MoSx-based thin films obtained by electrochemical reduction

作者: S.K. Ghosh , T. Bera , O. Karacasu , A. Swarnakar , J.G. Buijnsters

DOI: 10.1016/J.ELECTACTA.2010.10.065

关键词:

摘要: Abstract The in situ electrochemical deposition of nanostructured MoS x (  = 1.5–1.7) based thin films on various substrates from aqueous solutions is reported. as-deposited amorphous transform annealing into crystalline ones as revealed by a stepwise high temperature X-ray diffraction (XRD). Both Raman spectroscopy and XRD crystal structure analyses confirmed the formation inorganic fullerene-MoS nanoparticles IF -MoS ). have featureless surface morphology, but after either nanotube or nanorod along with numerous smaller nanoballs appear at surface. An investigation transmission electron microscopy unearths presence nanoballs, nanoribbons, nanotubes throughout annealed films. size range 5–10 nm. diameter 10–400 nm, length up to several micrometers evidenced SEM. catalytic effect transition metals growth noticed. temperature-induced transformation structured results large lowering coefficient friction under sliding against corundum ambient air 50% relative humidity.

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