作者: Lei Yuan , Yuanan Zhao , Congjuan Wang , Hongbo He , Zhengxiu Fan
DOI: 10.1016/J.APSUSC.2006.07.041
关键词:
摘要: Two kinds of HfO2/SiO2 800 nm high-reflective (HR) coatings, with and without SiO2 protective layer were deposited by electron beam evaporation. Laser-induced damage thresholds (LIDT) measured for all samples femtosecond laser pulses. The surface morphologies the depth information observed Leica optical microscopy WYKO profiler, respectively. It is found that had no positive effect on improving LIDT HR coating. A simple model including conduction band production via multiphoton ionization impact used to explain this phenomenon. Theoretical calculations show occurs first in coating layer. relation two coatings calculation agrees experiment result. (c) 2006 Elsevier B.V. All rights reserved.