Stress-strain curves of sputtered thin films of Ti−Ni

摘要: Abstract Ti−Ni thin films with three different compositions (Ti−48at.%Ni, Ti−50at.%Ni and Ti−51 at.%Ni) were prepared by sputtering. The sputter-deposited annealed at 773 K for 1 h to achieve crystallization. stress-strain curves the measured over a wide temperature range (143–473 K) using tensile tester. All showed yielding followed plateau region in curves. strain partly or completely recovered on unloading high test temperatures (superelasticity), whereas, low temperatures, remained after unloading, but subsequent heating (shape memory effect). did not show perfect recovery terms of either superelasticity shape effect. Ti−48at.%Ni effect, superelasticity. In contrast, Ti−51at.%Ni both effect