作者: Kang Su , Dameng Liu , Hua Pang , Tianmin Shao
DOI: 10.1080/02670844.2017.1341110
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摘要: ABSTRACTTiAlSiN coatings were deposited on Si substrates by ion beam-assisted deposition. The oxidation resistance and mechanism of TiAlSiN at 800°C, 900°C, 1000°C under a nitrogen atmosphere discussed compared with those argon air atmospheres. microstructure, bonding characteristics, phase transition the systematically investigated. results indicated that effectively inhibited coatings. key reason for this improvement was maintained Ti–N Si–N chemical bonds, dense Al2O3 layer much more easily generated atmosphere. We used first-principles calculations to investigate electronic structures characteristics in work.