Strain engineered graphene using a nanostructured substrate: I Deformations

作者: M. Neek-Amal , F. M. Peeters

DOI: 10.1103/PHYSREVB.85.195445

关键词:

摘要: Using atomistic simulations we investigate the morphological properties of graphene deposited on top a nanostructured substrate. Sinusoidally corrugated surfaces, steps, elongated trenches, one dimensional and cubic barriers, spherical bubbles, Gaussian bump depression are considered as support structures for graphene. The graphene-substrate interaction is governed by van der Waals forces profile layer determined minimizing energy using molecular dynamics simulations. Based obtained optimum configurations, found that: (i) placed over sinusoidally substrates with corrugation wave lengths longer than 2\,nm, sheet follows substrate pattern while supported it always suspended across peaks substrate, (ii) conformation to topography enhanced when increasing parameter in model, (iii) adhesion into trenches depends width trench graphene's orientation, i.e. contrast small (3 nm) nanoribbon armchair edges, zig-zag edges profile, (iv) atomic scale but not depression, (v) due varies range [0.1-0.4] J/m^2.

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