Three-dimensional nanometrology of microstructures by replica molding and large-range atomic force microscopy

摘要: Display Omitted We studied the combination of replica molding and atomic force microscopy.We characterized three-dimensional shape deep reactive ion etched cavities.We verified high-fidelity replication procedure in PDMS.Nanometer sized features uniformities can be readily measured.Silicon X-ray lenses are with an unprecedented precision. have used large-range microscopy to characterize high aspect ratio microstructures. Casting inverted replicas microstructures using polydimethylsiloxane (PDMS) circumvents inability AFM probes measure narrow cavities. investigated cylindrical cavities silicon wafers determined radius curvature (ROC) sidewalls as a function depth. Statistical analysis reliability reproducibility procedure. The mean ROC was (6.32?0.06)µm, i.e., 1% accuracy, while linearly increases by (0.52?0.03)µm from top bottom sidewalls. Nanometer surface defects also well replicated. In addition, method allows combining multiple differently processed into single sample, accelerating characterization process optimization tasks. To access sidewall samples needed cleaved. applied study refractive optics, whose performance is crucially affected their three dimensional shapes.