Emission spectrometry for discharge plasma diagnosis

作者: Kazuo Shimizu , Tetsuji Oda

DOI: 10.1016/S1468-6996(01)00140-1

关键词:

摘要: Emission spectrometry in the atmospheric pressure discharge was carried out to understand the reaction mechanisms of active species because the discharge plasma process is …

参考文章(14)
S. F. Miralaï, E. Monette, R. Bartnikas, G. Czeremuszkin, M. Latrèche, M. R. Wertheimer, Electrical and optical diagnostics of dielectric barrier discharges (DBD) in He and N2 for polymer treatment Plasmas and Polymers. ,vol. 5, pp. 63- 77 ,(2000) , 10.1023/A:1009531831404
G Dilecce, S De Benedictis, Experimental studies on elementary kinetics in N2-O2 pulsed discharges Plasma Sources Science and Technology. ,vol. 8, pp. 266- 278 ,(1999) , 10.1088/0963-0252/8/2/307
A. Ricard, A. R. de Souza, Active species in N2 flowing post-discharges Journal De Physique Iii. ,vol. 4, pp. 2593- 2600 ,(1994) , 10.1051/JP3:1994299
Fumiyoshi Tochikubo, Timm H. Teich, Optical Emission from a Pulsed Corona Discharge and Its Associated Reactions Japanese Journal of Applied Physics. ,vol. 39, pp. 1343- 1350 ,(2000) , 10.1143/JJAP.39.1343
M Simek, V Babický, M Clupek, S DeBenedictis, G Dilecce, P Sunka, Excitation of ) and ) states in a pulsed positive corona discharge in , - and -NO mixtures Journal of Physics D. ,vol. 31, pp. 2591- 2602 ,(1998) , 10.1088/0022-3727/31/19/032
A Ricard, The production of active plasma species for surface treatments Journal of Physics D. ,vol. 30, pp. 2261- 2269 ,(1997) , 10.1088/0022-3727/30/16/002
Alf Lofthus, Paul H. Krupenie, The spectrum of molecular nitrogen Journal of Physical and Chemical Reference Data. ,vol. 6, pp. 113- 307 ,(1977) , 10.1063/1.555546
Huei Tarng Liou, Fuh Tan Wang, Kung Lang Huang, Yih Chung Chang, Ozone formation studied by observing emission yielding from an oxygen-fed micro-discharge Ozone-science & Engineering. ,vol. 21, pp. 229- 238 ,(1999) , 10.1080/01919519908547238
A. Ricard, T. Czerwiec, T. Belmonte, S. Bockel, H. Michel, Detection by emission spectroscopy of active species in plasma–surface processes Thin Solid Films. ,vol. 341, pp. 1- 8 ,(1999) , 10.1016/S0040-6090(98)01529-6