作者: Sithara S. Nair , Chenyu Wang , Kenneth J. Wynne
DOI: 10.1016/J.PORGCOAT.2018.10.008
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摘要: Abstract Sylgard 184 is used for diverse applications including nanoimprinting, micro-electronic and mechanical systems (MEMS), soft robots, ice-phobic coatings tactile epidermal sensors. For such applications, understanding effects of processing conditions on nanoscale properties essential performance. It surprising, then, that little attention has been paid to cure temperature surface properties. The present work adds depth the complex relationships among hydrosilylation recognized autoxidation Si H OH secondary network formation by condensation. Peakforce Quantitative Nanomechanical Mapping (PF-QNM), an atomic force microscopy (AFM) mode was provide a map deformation, adhesion, dissipation, modulus morphology as function varying base-to-crosslinker ratio. interaction rich oxide layer silicon AFM tip with outermost silicone provided adhesion measurements revealed important composition. Results were interpreted in terms model concentration near from changes due condensation at high cure. Moduli found be comparable dynamic analysis (DMA), supporting PF-QNM tool property measurements. dependence nanosurface composition provides guidance future using Pt-cured silicones.