Functional photocatalytically active and scratch resistant antireflective coating based on TiO 2 and SiO 2
作者： M. Mazur , D. Wojcieszak , D. Kaczmarek , J. Domaradzki , S. Song
DOI: 10.1016/J.APSUSC.2016.01.226
关键词:
摘要: Abstract Antireflection (AR) multilayer coating, based on combination of five TiO 2 and SiO thin films, was deposited by microwave assisted reactive magnetron sputtering process microscope glass substrates. In this work X-ray diffraction, photoelectron spectroscopy, atomic force microscopy wettability measurements were used to characterize the structural surface properties coating. These studies revealed that prepared coating amorphous with low roughness. Photocatalytic determined phenol decomposition reaction. Measurements optical showed transmittance in visible wavelength range increased after deposition AR as-compared bare substrate. The mechanical basis nano-indentation scratch resistance tests. Performed research has shown an additional 10 nm thick film top layer, photocatalytically active, hydrophobic, resistant had hardness results indicate could be also as a self-cleaning protective
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