Method and system for the determination of arsenic in aqueous media
作者： Hugh Gotts , Jay Jung , Josh Golden , Marc Van Den Berg
DOI:
关键词:
摘要: A Raman spectroscopy method and system for quantifying the concentration of arsenic and/or other aqueous solution constituents. variety probe configurations a chemical auto-dosing are provided as well deconvoluting spectrum with overlapping peaks to identify quantify concentrations individual constituents based on single spectrum.
lens.org 参考文章(12)
John Houman, Electrolytic copper plating solutions ,(1983)
William J. Willis, Electrodeposition of copper, acidic copper electroplating baths and additives therefor ,(1981)
Roger F. Bernards, Patrick Houle, Gordon Fisher, Wade Sonnenberg, Copper electroplating solutions and processes ,(1991)
Sylvia Martin, Alkoxylated dimercaptans as copper additives and de-polarizing additives ,(1996)
Momcilo Miljkovic, Copper electroplating solutions and methods of making and using them ,(1987)
Robert E. Benner, Richard D. Rallison, George R. Gray, Ming-Wei Pan, Lee M. Smith, Raman spectroscopy apparatus and method using external cavity laser for continuous chemical analysis of sample streams ,(1999)
Bin Zhao, Yosi Schacham-Diamand, Prahalad K. Vasudev, Valery M. Dubin, Chiu H. Ting, Use of cobalt tungsten phosphide as a barrier material for copper metallization ,(1996)
Daniel Charles Edelstein, Judith Marie Rubino, George Frederick Walker, Cyryl Cabral, Carlos Juan Sambucetti, John G Gaudiello, Horatio Seymour Wildman, Method for forming Co-W-P-Au films ,(2001)
Thomas C. Scholer, Paul J. Steffan, Allen S. Yu, Method of defining copper seed layer for selective electroless plating processing ,(1999)