Process for cleaning water and organic solvent based lacquer from equipment using a single solvent mixture
作者： Udo Hellmann , Wolfgang Stricker , Werner Stephan
DOI:
关键词:
摘要: B) 65-85 wt. % of one or more aliphatic ketones the general formula II ##STR1## where R2=C 1-3 -alkyl and R3 =C1-3 R2 may be identical different.
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