An investigation of the reaction mechanism of copper fluoride carriers in the spectrochemical determination of boron and silicon
作者： L.S. Dale
DOI: 10.1016/0584-8547(76)80052-3
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摘要: Abstract The reaction mechanism by which copper (II) difluoride dihydrate and hydroxy fluoride increase the sensitivity of boron silicon in emission spectrochemical analysis has been studied with aid thermal gravimetric analysis. Both compounds decompose at relatively low temperature evolution hydrogen fluoride. It is shown that when are present as their oxides, they volatilised from system removal coincides This supports proposal increased achieved a result volatile formation.
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sci-hub.se 参考文章(6)
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