System and Method for Aligning a Wafer for Fabrication
作者： Gang Liu , David Michael
DOI:
关键词:
摘要: Described are computer-based methods and apparatuses, including computer program products, for aligning a wafer fabrication. A first image of portion is received from capturing device. second the device, wherein an device transform defines relationship between fiducial pattern in identified, based on transform, that defines, specification wafer, pattern, threshold value configured to identify low contrast patterns wafers. An alignment determined identified patterns.
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