Surface Morphology of Annealed Polystyrene and Poly(methyl methacrylate) Thin Film Blends and Bilayers

摘要: Thin films of polystyrene (PS) and poly(methyl methacrylate) (PMMA) were spun-cast onto silicon substrates, annealed, analyzed by atomic force microscopy (AFM), total electron yield (TEY), partial (PEY) near-edge X-ray absorption fine structure (NEXAFS) spectroscopy in order to resolve conflicting prior literature regarding the tendency PS form a wetting layer or overlayer on top PMMA. From comparison three methods analysis basis extraordinary surface sensitivity PEY NEXAFS, we conclude that does not an samples with morphologies near thermodynamic equilibrium. The forms droplets large size range PMMA wets hydrophilic SiOx substrate. our results, maximum thickness continuous would be about 0.25 nm. This is contrast recent experiments imply equivalent 5−10 nm forming during annealing.