Reflectance and Ellipsometry When Submicroscopic Particles Bestrew a Surface

摘要: A method is described for computing optical properties of surfaces with a sparse distribution submicroscopic bumps, pits, or foreign particles on imbedded in them. The are assumed to be approximate figures revolution about an axis normal the surface. Surface and particle have uniform, isotropic values refractive index. Such roughness equivalent thin flat film uniaxial material its optic thickness arbitrarily made equal volume per unit area all bumps pits. principal index this determined by shape any surface irregularity associated them, indices substrate, but not size if small compared wavelength incident radiation. recent experimental observation that silver tarnish form isolated substrate gives same ellipsometric perturbation as would expected from density appears only rough approximation. Even approximation fail were metallic embedded Differences constants derived measurements thick very films explained.