作者: Mikhail Sumetsky , Yury Dulashko , Tom P. White , Tim Olsen , Paul S. Westbrook
DOI: 10.1364/AO.42.002336
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摘要: We demonstrate a novel interferometric technique for highly accurate characterization of phase masks used in optical fiber grating fabrication. The principle the measurement scheme is based on analysis interference pattern formed between first- and zero-order beams transmitted through or reflected from under test. For spatial resolution few millimeters, our methods allow determination local variations order 1-µm period with an accuracy picometers. These are applicable to broad class diffractive structures.