Comparative study of low‐pressure rare‐gas fluoride/chloride lasers excited by a short‐pulse electron beam
作者： Akira Suda , Hiroshi Kumagai , Shingo Izawa , Minoru Obara
DOI: 10.1063/1.341766
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摘要: Output characteristics of the short‐pulse electron‐beam excited ArF (193 nm), KrF (248 XeF (351 KrCl (222 and XeCl (308 nm) lasers were experimentally investigated at same time on device for various mixtures all pumped a high excitation rate 2.3 MW/cm3. The optimum pressure rare gas forming its rare‐gas halide excimer increased sequence ArF, KrCl, KrF, XeCl, XeF, indicating that halides more quenched by heavier gases, such as Xe, even near‐atmospheric pressures. At nearly atmospheric pressures Ar‐buffered gave higher laser energy than Ne‐buffered except laser. Through series measurements, showed best result output 96 J (5 J/l ) with an intrinsic efficiency 3.4%.
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